FE8135 Nanostructuring, NTNU / University of Bergen

Academic content

The course consists of three modules, which covers important techniques for nanostructuring of solids. The
course modules are

  • Electron beam lithography (EBL)
  • Nanoimprint
  • Focused ion beam (FIB) lithography
The EBL-module includes processing of defined structures in metal layers by electron beam evaporation and
etching processes. Issues regarding dosage, optimization and limitation in the pattern generation will also be
The nanoimprint module will provide an overview of the most important implementations of nanoimprint
lithography, with emphasis on photo nanoimprint lithography (P-NIL). Issues regarding template/mold
fabrication, wafer-scale imprint, benefits, limitations, and concerns with this technique for structuring on the sub-
100 nm length scale will be discussed.
The FIB-module will discuss the principles of this instrument, used as a tool for precision milling, deposition, and
imaging of nanoscale structures in solids. Benefits and concerns with this technique, as well as different
applications ranging from preparation of samples for transmission electron microscopy (TEM) to 3D
characterization and corrective measures on integrated circuits (ICs) will be discussed.

Teaching methods and activities

Lectures, self-study and laboratory exercises. This course is part of the course portfolio supported by the
Norwegian PhD Network in Nanotechnology for Microsystems (www.nano-network.net ), and will be taught in
three seminars, each of one week duration. The EBL-module will be given at the University of Bergen,
Department of physics and technology, by Professor Bodil Holst, while the nanoimprint and FIB modules will be
taught at NTNU, with Professor Jostein Grepstad and Associate Professor Antonius T. J. van Helvoort as the
respective lecturers. The cleanroom at NTNU NanoLab will be used for laboratory training in the nanoimprint
and FIB modules.
Maximum number of students is 8 . Students enrolled in the Norwegian PhD Network on Nanotechnology for
Microsystems and for whom this course is part of their PhD course plan, will be given priority.

Learning objectives:

 Knowledge: The course aims to provide knowledge on electron beam lithography (EBL), nanoimprint and
focused ion beam (FIB) lithography.
Skills: The course will provide training on listed techniques in the cleanroom.

Recommended prev. knowledge

 Thin film/semiconductor technology, solid state physics/chemistry, Scanning electron microscopy (SEM)

Teaching institutions

The course is officially registered at NTNU, Department of Electronics and Telecommunication, and Professor Jostein Grepstad is the administrator of the course. He will also teach the Nanoimprint-module. However, the EBL-module will be taught at the University of Bergen, and the FIB-module will be taught at Dept. of Physics at NTNU.

Course materials

Given at course start